FPC exposure device
Device for forming circuits on flexible printed circuit boards (FPC).
We offer a lineup of products that use roll-to-roll pitch feeding to imprint patterns onto dry film.
- 企業:ウシオライティング
- 価格:Other
1~15 件を表示 / 全 17 件
Device for forming circuits on flexible printed circuit boards (FPC).
We offer a lineup of products that use roll-to-roll pitch feeding to imprint patterns onto dry film.
This is an introduction to the lineup of parallel light exposure devices.
As a uniform irradiation light source, it is used for various applications such as precision pattern exposure, pattern exposure of semiconductor device elements, and wafer exposure.
Applicable to all photosensitive materials!
Focusing on exposure light sources, we offer a wide range of products for the printing (plate making, printing) and electronics (artwork, exposure) fields.
High-precision single-sided exposure device for flexible printed circuit boards (FPC)
High resolution can be obtained with a parallel light source.
High-precision double-sided exposure device for flexible printed circuit boards (FPC)
Achieving high productivity through simultaneous exposure on both sides.
Semi-automatic exposure device with alignment for film that demonstrates its power in FPD manufacturing processes.
Equipped with a 5kW short arc UV lamp.
Alinea, which excels in productivity and usability, features automatic microscope movement and more.
This is a manual exposure device compatible with 2-inch wafers. It is an exposure device where the operator manually sets the wafer. Using a 4-inch glass mask, the alignment marks of the photomask and the wafer are imaged through a microscope, allowing for alignment and exposure gap settings while viewing the displayed image on a monitor. Additionally, when the exposure switch is pressed, the microscope automatically retracts, the lamp house moves to the designated position, and the exposure is performed with the set light intensity, followed by automatic retraction.
It is a small, low-power consumption, long-life ultraviolet LED exposure lamp.
This is a exposure lamp for metal photo that we sell. Until now, we have been using high-output lamps such as xenon lamps, metal halide lamps, and mercury lamps, but recently we have adopted the trendy LED light and developed our own ultraviolet LED exposure lamp. 【Features】 ■ Comes with an adjustable height arm and a digital timer ■ The LED part is detachable from the arm and weighs only 220g ■ The vacuum table listed in the catalog is also a product designed in-house ■ Not limited to metal photo, it can be used for other applications as long as the wavelength and output match ■ Since it is designed in-house, customization is possible, such as changing the light source or adjusting the size.
It is a compactly designed parallel light exposure device.
This device is a parallel light exposure system using a point light source of a super high-pressure mercury lamp, employing a collimation mirror method. The main components consist of a light source section, an adsorption-type exposure table section, and a mask section, with the exposure method capable of vacuum contact (hard contact) exposure. Upon request, a proximity method is also available. To manage exposure, it is equipped with an integrated light meter, making it easier to set the appropriate exposure amount. It is a compactly designed exposure device with a stand. For more details, please contact us or download the catalog.
Equipped with an image processing automatic alignment system using a CCD camera.
It is an automatic alignment exposure device equipped with an image processing automatic alignment system using a CCD camera.
The conveying system can be used inline with a roller conveyor method!
It is an exposure machine that aligns a glass mask and a workpiece in the photolithography process for glass substrates, and transfers fine mask patterns using soft contact exposure.
It is a high-precision exposure device equipped with a Fresnel lens.
This is a high-precision exposure device equipped with a Fresnel lens. It reduces distortion in the screen frame with a new vacuum system and further improves light distribution balance. We offer two types: a screen frame device and a large device for PDP.
Pseudo-parallel light exposure device equipped with a Fresnel lens
Screen version, used in the film exposure process.
A lithography machine that aligns the glass mask and workpiece to transfer fine mask patterns.
We have both automatic and manual exposure machines available.
Ushio Lighting will assist you with advanced lighting technology.
If you have any questions, please feel free to contact us.